The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Feb. 24, 2000
Applicant:
Inventors:
Arne Watson Ballantine, Cold Spring, NY (US);
Douglas Duane Coolbaugh, Essex Junction, VT (US);
Jeffrey D. Gilbert, South Burlington, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract
A method of substantially reducing stress in a trench comprising forming at least one trench in a substrate, said substrate having a surface; filling the at least one trench with a trench dielectric material; planarizing the filled trench stopping on said surface of said substrate; and subjecting the planarized trench to an anneal step, said anneal step being carried out under rapid thermal conditions at a temperature of about 800° C. or above and in the presence of an atmosphere comprising hydrogen.