The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2001

Filed:

Jul. 28, 1998
Applicant:
Inventors:

Yuichiro Shindo, Toda, JP;

Tsuneo Suzuki, Toda, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 3/000 ; H01L 1/147 ;
U.S. Cl.
CPC ...
C22C 3/000 ; H01L 1/147 ;
Abstract

Mn alloy materials for magnetic materials contain 500 ppm or less, preferably 100 ppm or less, oxygen, 100 ppm or less, probably 20 ppm or less, sulfur, and preferably a total of 1000 ppm or less, more preferably 500 ppm or less, impurities (elements other than Mn and the alloying component). The alloying component that forms an alloy with Mn is one or two or more elements selected from the group consisting of Fe, Ir, Pt, pd, Rh, Ru, Ni, Cr and Co. Sputtering targets formed from the Mn alloy materials for use in depositing magnetic thin film, and the thin films so produced.


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Shindo, Yuichiro. (2001). Mn alloy materials for magnetic materials, mn alloy sputtering targets, and magnetic thin films (U.S. Patent No. 6270593). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6270593

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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