The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2001
Filed:
Mar. 26, 1996
Tetsuya Mori, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes an exposure device for exposing an exposure area of a substrate to a pattern of a mask, wherein the mask pattern is provided on the basis of a design pattern, and the mask pattern deviates in at least one of position, size and shape, from the design pattern, and a detector for detecting the deviation of the mask pattern from the design pattern and for producing a detection output. The exposure device is responsive to the output of the detector to effect an exposure operation to compensate for the pattern deviation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile