The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 2001

Filed:

Nov. 24, 1998
Applicant:
Inventors:

Yoshiyuki Ishigaki, Hyogo, JP;

Yasuhiro Fujii, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/976 ; H01L 2/994 ; H01L 3/1062 ; H01L 3/1113 ; H01L 3/1119 ;
U.S. Cl.
CPC ...
H01L 2/976 ; H01L 2/994 ; H01L 3/1062 ; H01L 3/1113 ; H01L 3/1119 ;
Abstract

In an access transistor formed on a silicon substrate, its drain region is formed of n,type and n,type drain regions and its source region is formed of n,type and n,type source regions. In a driver transistor, its source region is formed of n,type and n,type source regions and its drain regions is formed of n,type and n,type drain regions. The n,+type source region is formed deeper than the n,type drain region. Accordingly, a semiconductor device ensuring improvement in a static noise margin while suppressing increase in manufacturing cost is provided.


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Ishigaki, Yoshiyuki. (2001). Semiconductor device having impurity regions with varying impurity concentrations (U.S. Patent No. 6268627). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6268627

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