The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2001
Filed:
Feb. 24, 2000
Yoshihisa Matsubara, Tokyo, JP;
Kazumi Sugai, Tokyo, JP;
Nobukazu Ito, Tokyo, JP;
Kazuyoshi Ueno, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
In a process for manufacturing a semiconductor device where a plurality of wafers are formed on a single wafer, comprising the steps of forming a groove pattern in an insulating layer on a wafer; forming a seed metal layer in the groove by spattering; depositing an interconnection metal layer on the seed metal layer by electrolytic plating; and then flattering the wafer to the surface of the insulating layer, during forming the groove pattern in the insulating layer, the groove pattern is formed in the area on the wafer where devices can be taken while forming a dummy pattern up to 30 &mgr;m long in the wafer periphery where devices cannot be taken, to prevent the interconnection metal layer from being peeled in the wafer periphery.