The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2001
Filed:
Feb. 27, 1998
Yoshiyuki Sekine, Utsunomiya, JP;
Ryusho Hirose, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection exposure apparatus includes an illumination optical system for illuminating a mask with light from a light source and a projection optical system having at least one diffractive optical element, for projecting an image of a pattern of the mask, as illuminated, onto a substrate. The at least one diffractive optical element is adapted to produce first diffraction light of an order to be used for projection of the image and second diffraction light of an order different from that of the first diffraction light. A portion of the second diffraction light is projected onto the substrate to provide a substantially uniform intensity distribution.