The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2001
Filed:
Oct. 14, 1997
Mark I. Gardner, Cedar Creek, TX (US);
Mark C. Gilmer, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A transistor is provided having a metal silicide gate spaced above a semiconductor substrate by a high-dielectric-constant ceramic gate dielectric. The entire gate conductor is preferably composed of a metal silicide. In an embodiment, the metal silicide is cobalt silicide and the ceramic gate dielectric is barium strontium titanate, lead lanthanum zirconate titanate barium zirconate titanate, cerium oxide, or tin oxide. In another embodiment, the ceramic gate dielectric has nitrogen atoms incorporated therein. The transistor may also include dielectric spacers adjacent opposed sidewall surfaces of the gate conductor, lightly doped drain regions arranged underneath the spacers, and source and drain regions arranged adjacent the lightly doped drain regions.