The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Mar. 15, 2000
Applicant:
Inventor:
Atsuki Ono, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18238 ;
U.S. Cl.
CPC ...
H01L 2/18238 ;
Abstract
After a source-drain region is formed, fluorine,is ion-implanted into the entire surface of a substrate and thereafter a heat treatment is conducted, for example, at 600 to 800° C. Through this heat treatment, the dangling binds and the Si—H bonds in the channel regions,are substituted by the Si—F bonds, which prevents the generation of the negative bias temperature instability effect in a MOSFET.