The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Dec. 21, 1999
Applicant:
Inventors:
Jean-Luc Meunier, Montreal, CA;
Munther Kandah, Irbid, JO;
Assignee:
McGill University, Montreal, CA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 1/908 ;
U.S. Cl.
CPC ...
B01J 1/908 ;
Abstract
A method and apparatus for vacuum arc deposition of carbon on a substrate inhibits or eliminates emission of contaminating carbon particles in the ion plasma by maintaining an elevated local plasma pressure at the cathode or target surface, thereby minimizing the role of heat conduction in the creation of the particles and strongly increasing the electron emission cooling effects.