The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2001
Filed:
Apr. 17, 2000
Applicant:
Inventor:
Masahiro Shimizu, Kofu, JP;
Assignee:
Tokyo Electron Limited, Tokyo-To, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A vacuum process system is equipped with a process vessel,for carrying out a vacuum process for an object S housed therein to be processed, using a process gas. A transparent window,is provided in the wall of the process vessel,Outside of the transparent window,there is arranged a radiation thermometer,for carrying out the thermometry of the object S in the process vessel,via the transparent window. A plurality of micro holes,for inhibiting a thin-film deposition are formed on the internal surface,of the transparent window,facing the interior of the process vessel