The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Mar. 10, 1999
Pierre Monsallut, Paris, FR;
CAMECA, Courbevoie, FR;
Abstract
Disclosed is a method for measuring the depth of the bottoms of craters under formation on a sample placed within an analysis chamber of a physico-chemical analyzer, by optical interferometry. The method consists in splitting an incident bi-frequency laser beam into two parallel paths, a measurement path and a reference path, focusing each of the two paths on the surface of the sample, respectively one in the crater and the other in the vicinity, along an incident direction inclined in relation to the surface of the sample, recombining the two beams reflected on the surface of the sample to form only one beam, and applying the recombined beam to an interferometric detector to measure the path difference between the two reflected beams. Application to ion analyzers.