The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2001
Filed:
Jul. 12, 1999
Applicant:
Inventors:
Kyle M. Hanson, Kalispell, MT (US);
Robert A. Weaver, Whitefish, MT (US);
Jerry Simchuk, Kalispell, MT (US);
Raymon F. Thompson, Kalispell, MT (US);
Assignee:
Semitool, Inc., Kalispell, MT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25B 9/00 ; C25C 7/00 ; C25D 1/700 ;
U.S. Cl.
CPC ...
C25B 9/00 ; C25C 7/00 ; C25D 1/700 ;
Abstract
In an electroplating reactor for plating a spinning wafer, a diffusion plate is supported above an anode located within a cup filled with process fluid within the reactor. The diffusion plate includes a plurality of openings which are arranged in a spiral pattern. The openings allow for an improved plating thickness distribution on the wafer surface. The openings can be elongated slots curved along the direction of the spiral path.