The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2001
Filed:
Jun. 02, 1999
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
A cleaning apparatus has a processing tank (,) for containing a processing liquid in which semiconductor wafers (W) are immersed, and a tubular vessel(,) having a processing chamber (,) containing the processing tank (,). A side wall (,) of the vessel (,), and a first partition wall (,) having an upright wall (,) standing on a bottom plate (,) defining the bottom of the processing chamber (,) form a side ventilating duct (,). The bottom wall (,) of the vessel (,), and a second partition wall (,) substantially horizontally extending from the lower end of the first partition wall (,) form a bottom ventilating duct (,). The side ventilating duct (,) and the bottom ventilating duct (,) can compactly arrange devices and pipes for supplying and discharging the cleaning liquid for cleaning semiconductor wafers (W), easily maintain the devices and pipes, easily arrange a ventilating system to the cleaning apparatus, and improve ventilation efficiency.