The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2001

Filed:

Feb. 22, 2000
Applicant:
Inventors:

Yoshiki Aruga, Tokyo, JP;

Koji Maeda, Tokyo, JP;

Assignee:

Anelva Corporation, Fuchu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/434 ;
Abstract

A substrate holder,where a thin film has accumulated on the surface of the holding claws,is transferred in a state where no substrate,is being held into a film removal chamber,which is established branching off in such a way that the vacuum is connected from the square transfer path,along which a plurality of vacuum chambers including the film deposition chambers,and,is established. A high frequency power supply,is connected via the movable electrode,to the holder body,and a high frequency electric field is established within the film removal chamber,A plasma is formed by generating a high frequency discharge in the gas which is being delivered by means of the gas delivery system,and the accumulated film on the surface of the holding claws,is removed in a vacuum by sputter etching due to ion impacts.


Find Patent Forward Citations

Aruga, Yoshiki. (2001). Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatus (U.S. Patent No. 6251232). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6251232

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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