The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2001
Filed:
Dec. 16, 1998
Applicant:
Inventors:
Hideaki Okamura, Osaka, JP;
Shinichi Imai, Osaka, JP;
Nobuhiro Jiwari, Osaka, JP;
Yoko Tohmori, Osaka, JP;
Assignee:
Matsushita Electronics Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 ;
U.S. Cl.
CPC ...
H05H 1/00 ;
Abstract
A plasma processing apparatus includes a reaction chamber in which plasma is generated from a reactive gas introduced thereto and a film on a substrate is processed with the plasma generated. The main members of the reaction chamber are covered with protective members made of synthetic quartz.
Okamura, Hideaki. (2001). Apparatus and method for plasma processing (U.S. Patent No. 6251216). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6251216
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile