The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
Sep. 29, 1998
Japan Energy Corporation, Tokyo, JP;
Abstract
A target material for sputtering composed of a perovskite type composite oxide sintered body of the general formula Ba,Sr,TiO,(where 0≦x<1 and 0≦y<0.5), in which the content of each element in the group consisting of Na, K, Mg, Fe, Ni, Co, Cr, Cu, and Al is 1 ppm or less and the content of each element of U and Th is 1 ppb or less. A thin film of Ba,Sr,TiO,deposited by use of the target material exhibits outstanding dielectric properties, reduces the leakage current that has been a problem in the art, and prevents software error. The invention also provides a sputtering target of a sintered body having a relative density of 97% or more and an average grain diameter of 3 &mgr;m or less. It permits the manufacture of thin films with few particle defects and enhanced mechanical strength.