The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
Mar. 13, 2000
Applicant:
Inventors:
Ser Wee Sebastian Quek, Singapore, SG;
Charles Lin, Singapore, SG;
Jimmy Lo Yuk Ting, Singapore, SG;
Assignee:
Chartered Semiconductor Manufacturing Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65C 3/26 ;
U.S. Cl.
CPC ...
B65C 3/26 ;
Abstract
An improved and new substrate carrier head for use in a CMP apparatus is described. The new substrate carrier head has a substrate retaining ring with embedded intersecting channels in the outer face. The embedded intersecting channels improve the circulation of polishing slurry to and from the polished substrate and polishing byproducts away from the polished substrate and thereby improve the polishing uniformity on the substrate.
Quek, Ser Wee Sebastian. (2001). Chemical mechanical polishing apparatus improved substrate carrier head and method of use (U.S. Patent No. 6245193). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6245193
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile