The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2001

Filed:

Aug. 19, 1998
Applicant:
Inventors:

Hideaki Ohnishi, Akishima, JP;

Yukihito Kondo, Akishima, Tokyo, JP;

Kunio Takayanagi, Kawasaki, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/312 ; G21K 5/10 ;
U.S. Cl.
CPC ...
G01N 1/312 ; G21K 5/10 ;
Abstract

The present invention is to provide a microscopic system by which a simultaneous observation at an ultra high vacuum condition by an electron microscope and by a scanning probe microscope is possible in an ultra high vacuum electron microscope chamber,equipped with an observation stage,, to which an ultra high vacuum chamber,for a scanning probe microscope equipping with a scanning probe microscope holder,in which scanning probe microscope is contained and a specimen treatment chamber,possessing a specimen holder,on which a specimen is held are connected. Said each chamber of microscopic system can be separately exhausted to the ultra high vacuum level and the specimen holder and the scanning probe microscope holder can voluntarily be fixed to said observation stage and be removed from said observation stage.


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