The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2001
Filed:
May. 07, 1998
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A method for manufacturing a master disk for forming an optical disk, including the steps of forming an SiO,film on a substrate; coating a first photoresist layer on the SiO,film; exposing the first photoresist layer according to patterns of a groove formation recess and a land formation protrusion corresponding to a groove and a land, respectively; etching the first photoresist layer and the SiO,film, to thereby form the groove formation recess and the land formation protrusion on the SiO,film; coating a second photoresist layer on the SiO,film, to thereby form the groove and the land at positions corresponding to the groove formation recess and the pit protrusion, respectively; exposing the second photoresist layer according to patterns of a pit where predetermined information is recorded; and etching the second photoresist layer, to thereby form the pits in the groove and the land.