The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2001
Filed:
Feb. 05, 1999
Byoung-taek Lee, Seoul, KR;
Samsung Electronics Co., Ltd., Kyungki-do, KR;
Abstract
A capacitor of a semiconductor device includes a first interlayer dielectric film pattern formed on a semiconductor substrate and having a first contact hole therein and a contact plug buried in the first contact hole and electrically connected to the semiconductor substrate. A diffusion barrier layer pattern is formed on the contact plug, and a first conductive film pattern is formed on the diffusion barrier layer pattern for preventing the oxidization of the diffusion barrier layer pattern. A second interlayer dielectric pattern having a second contact hole exposing the surface of the first conductive film pattern is formed on the first interlayer dielectric film pattern and the first conductive film pattern. A second conductive film pattern used as the lower electrode of a capacitor is buried in the second contact hole and connected to the first conductive film pattern. A high dielectric film and a third conductive film pattern used as the upper electrode of the capacitor are sequentially formed so as to surround the second conductive film pattern. The first conductive film pattern is formed of a platinum group metal or a conductive oxide including the platinum group metal. According to the present invention, it is possible to prevent the increase of a contact resistance since the first conductive pattern prevents diffusion barrier layer pattern from oxidizing.