The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Dec. 23, 1999
Toshiyuki Suemitsu, Minoo, JP;
Nobuyuki Mori, Yao, JP;
Masahide Yokoyama, Hirakata, JP;
Masahiro Yamamoto, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Abstract
The plasma processing apparatus includes a substrate table,that extends from a wall of the vacuum chamber,toward the inside of the vacuum chamber,. A rotary holder,, to which the substrate,is mounted, is arranged in a concave portion,that is provided in the substrate table,. The rotary holder,is rotatably supported with its periphery being sealed with a sealing member,. Blades,are provided inside the rotary holder,. A supply port,and a drainage port,, for supplying and draining a fluid such that a rotation force is exerted on the blades,, are formed in the substrate table,. Supplying a fluid through the supply port,cools the substrate,while causing it to rotate.