The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Jul. 09, 1998
Applicant:
Inventors:
Robert G. Ozarski, Poway, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Assignee:
Cymer, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/608 ;
U.S. Cl.
CPC ...
G02B 2/608 ;
Abstract
A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools.