The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
May. 12, 1995
William G. McKinley, Littleton, MA (US);
Gerard M. Perron, Acton, MA (US);
Berge Tatian, Stoneham, MA (US);
The B. F. Goodrich Company, Charlotte, NC (US);
Abstract
A photolithography system includes a light source and illumination optics which receive light from the light source and project illumination light onto a mask. Light transmitted through the mask is received by projection optics which generate an enlarged image of the mask. The enlarged image is projected onto the surface of a substrate such as a semiconductor wafer or flat panel display. The system achieves a wafer or panel feature size of less than 10 &mgr;m, preferably 3 &mgr;m, while enlarging the image of the mask to produce large wafers and panels in a single exposure. A deformable substrate chuck is selectively deformable to ensure a flat substrate surface. An alignment subsystem ensures precise registration between exposure layers.