The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Jan. 12, 2000
Applicant:
Inventors:
Hidefumi Nakanishi, Shiga-ken, JP;
Atsushi Sakurai, Kyoto, JP;
Masato Kobayashi, Ohmihachiman, JP;
Yukio Yoshino, Ohtsu, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 4/1047 ; H03H 3/08 ;
U.S. Cl.
CPC ...
H01L 4/1047 ; H03H 3/08 ;
Abstract
By using a dual ion-beam sputtering apparatus, an aluminum thin-film is formed on a glass substrate made of an amorphous material. While radiating an ion beam for assisting the film formation from an ion source onto the glass substrate, the aluminum thin-film is formed by depositing the sputtering ions which are generated by radiating an ion beam onto an aluminum target.