The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Feb. 22, 2000
Applicant:
Inventors:
Tadahito Fujisawa, Tokyo, JP;
Soichi Inoue, Yokohama, JP;
Hiroshi Nomura, Kawasaki, JP;
Ichiro Mori, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ; G03F 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ; G03F 9/00 ; G03C 5/00 ;
Abstract
An exposure monitor mask used with an exposure system for manufacturing ICs includes an exposure detecting pattern having at least three patterns arranged in one direction, the exposure detecting pattern including a pair of relative position detecting patterns with at least one variable intensity pattern that allows the intensity of light transmitted therethrough to vary monotonously in the one direction disposed between the pair of relative position detecting patterns.