The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Aug. 25, 1999
Applicant:
Inventors:
Justin R. Lydon, Battle Ground, WA (US);
Brian L. Tansy, Vancouver, WA (US);
Assignee:
SEH America, Inc., Vancouver, WA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/3223 ; G01N 2/164 ; H01L 2/166 ;
U.S. Cl.
CPC ...
G01N 2/3223 ; G01N 2/164 ; H01L 2/166 ;
Abstract
A method of controllably adding at least one contaminant to a surface of a silicon wafer. The method includes providing a solution containing a known concentration of one or more contaminants and having a known pH. The solution is applied to a surface of a silicon wafer and allowed to remain there for a predetermined period of time so that the one or more contaminants adsorb to the wafer surface. The solution is then removed while leaving the adsorbed one or more contaminants on the surface.