The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Jan. 25, 1999
Kazuhiro Hamamoto, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
An integrated circuit includes a substrate (,) having a conductive region (,), and includes a dielectric layer (,) disposed over the substrate. An upwardly tapering frustoconical opening (,) is created through the dielectric layer to the conductive region. A barrier layer (,) is then applied, after which a thin metal layer (,) is applied, the upper end of the opening being pinched off or closed by the metal layer. Heat and pressure are then simultaneously applied, so that the metal layer flows to completely fill the available space within the opening. Selected portions of the metal layer external to the opening are then etched away. A further dielectric layer (,) is applied over the barrier layer and metal layer, and then planarization is carried out on the further dielectric layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile