The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Jan. 08, 1999
Applicant:
Inventor:
Sunil Wickramanayaka, Tokyo, JP;
Assignee:
Anelva Corporation, Fuchu, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A plasma processing system includes a reactor having a plasma source and a substrate holder. The reactor is configured by a top plate made of a nonmagnetic metal, a bottom plate made of a metal, and a cylindrical side wall having at least in part a section made of ceramic. The substrate holder is placed in the bottom plate. A plurality of magnets is separately arranged on the top plate. The polarity of the magnets facing the inside of the reactor is alternately changed, and the magnets generate a magnetic field with closed magnetic fluxes near to the inner surface of the top plate.