The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Apr. 16, 1998
Matsushita Electronics Corporation, Osaka, JP;
Abstract
A manufacturing apparatus for semiconductor devices comprises as a halogen scavenger a silicon ring (,) having an average surface roughness of 1-1000 &mgr;m, arranged around a silicon substrate (,) on a lower electrode (,) in a reaction chamber (,); and an upper silicon element (,) as another halogen scavenger, having an average surface roughness of 1-1000 &mgr;m, arranged above the silicon substrate (,). In this apparatus, C,F,is used as a gas to be introduced into the chamber (,) and fluorine can be effectively scavenged in the initial phase of operation, so that semiconductor devices can be aged faster than in conventional apparatus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile