The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Dec. 07, 1998
Kyung-Ho Park, Dallas, TX (US);
Chih-Chen Cho, Richardson, TX (US);
Ming Jang Hwang, Dallas, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of forming a semiconductor device includes separating a semiconductor gate body from the outer surface of the substrate by a gate insulator layer, forming a conductive drain region in the outer surface of the substrate and spaced apart from the gate conductor body, and forming a conductive source region in the outer surface of the substrate and spaced apart from the gate conductor body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer. The method also includes depositing a metal buffer layer over the conductive source region and conductive drain region, depositing a metal layer over the metal buffer layer, and reacting the metal layer and metal buffer layer with the conductive source region and conductive drain region to form respective first and second silicide regions.