The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2001
Filed:
Feb. 08, 1999
Tsung-Lin Lu, Tainan Hsien, TW;
Ping-Chung Chung, Hsinchu Hsien, TW;
Tso-Lung Lai, Taoyuan Hsien, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method is proposed for use in a chamber used in IC fabrication to adjust for parallel alignment between a shower head and a heater platform in the chamber, so that later the deposition process performed in the chamber can result in an evenly deposited layer on the wafer. This method is characterized by the provision of a plurality of displacement gauges between the shower head and the heater platform, with the heater platform being adjusted in such a manner as to allow all the distance readings from the displacement gauges to be substantially equal to a predetermined fixed value. This not only allows the shower head and the heater platform to be aligned and parallel to each other, but also allows them to be separated by a predetermined, fixed distance. The parallel alignment allows all deposition processes subsequently performed in the chamber to provide an evenly deposited layer on the wafer, and the fixed distance between the shower head and the heater platform allows the wafers fabricated from different chambers to be consistent in quality.