The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2001

Filed:

Sep. 21, 1999
Applicant:
Inventors:

Roy E. Rand, Palo Alto, CA (US);

Khem Garewal, San Ramon, CA (US);

James F. Heilman, San Jose, CA (US);

Assignee:

Imatron, Inc., South San Francisco, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/514 ;
U.S. Cl.
CPC ...
H01J 3/514 ;
Abstract

In a scanning electron beam CT system, a positive ion clearing electrode system is disposed within the CT system solenoid coil, and is operated from a single power source. Mounted coaxially about the electron beam, preferably the electrode system includes three sections, each having two electrode elements, one element being coupled to about −800 V to about −2 kV and the other element being grounded. Within the electrode system, the ratio between element diameter and electron beam diameter is substantially constant. Preferably elements are helically twisted about the beam axis. The electrode configuration cancels net quadrupole (focusing) and octopole (aberration-producing) fields. In the presence of electric discharge, essentially zero electron beam displacement and deflections occurs, and changes in focusing strength remain zero.


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