The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2001

Filed:

Jun. 11, 1998
Applicant:
Inventors:

Shang-Hong Lai, Plainsboro, NJ (US);

Ming Fang, Cranbury, NJ (US);

Assignee:

Siemens Corporate Research, Inc., Princeton, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/00 ;
U.S. Cl.
CPC ...
G01V 3/00 ;
Abstract

An intensity inhomogeneity correction system includes a log operator which performs a log operation on the intensity values of the original MR image. A regular grid generator partitions the image domain and then a compute and select establishes reliable orientation constraints at grid locations. A bias field surface reconstructor reconstructs a bias field surface from selected orientation constraints with a thin-plate spline by using a preconditioned conjugate gradient. An intensity inhomogeneities remover subtracts an estimated bias function from the original log image and an exponential operation on the bias-field corrected log image provides a corrected image.


Find Patent Forward Citations

Loading…