The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2001
Filed:
Nov. 12, 1997
Yozo Kosaka, Tokyo, JP;
Katsuhiko Mizuno, Tokyo, JP;
Takeshi Nakamura, Tokyo, JP;
Kounosuke Tanaka, Tokyo, JP;
Toshihiko Takeda, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A transfer sheet and a pattern-forming method suitable for forming high-precision patterns for layers such as electrode layers, dielectric layers and barrier layers in the process of producing plasma display panels, image display devices, thermal heads, integrated circuits, etc., and capable of forming patterns having superior surface smoothness, a uniform thickness and high profile precision in a reduced period of time and in high yields. The transfer sheet has an ink layer over a base film. The ink layer consists essentially of an inorganic component containing at least a glass frit, and a thermoplastic resin. The ink layer contains from 3 parts to 50 parts by weight of the thermoplastic resin with respect to 100 parts by weight of the inorganic component. According to the pattern-forming method, a pattern is transferred onto a substrate by using the transfer sheet, and then firing is carried out, thereby forming a high-precision pattern, e.g. an electrode layer, a dielectric layer, a barrier layer, etc.