The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2001
Filed:
Mar. 24, 1999
Mounir Laroussi, Knoxville, TN (US);
Gary S. Sayler, Blaine, TN (US);
Battle B. Glascock, Signal Mountain, TN (US);
The University of Tennessee Research Corporation, Knoxville, TN (US);
Abstract
Voltage is applied to conducting loops wrapped around the outside of a non-conducting chamber (e.g., a glass tube) to generate a capacitively coupled discharge plasma inside the chamber. In one embodiment, a seed gas is injected into the chamber through an inlet in an otherwise closed end of the chamber, while the other end is open to the ambient atmosphere. In such an embodiment, the seed gas is used to ignite the plasma in air at essentially atmospheric pressure. The present invention has different applications, including, but not limited to, (a) passivating toxic or polluting gases that are injected into the chamber along with the seed gas and (b) treating materials placed within a second chamber that is connected to the open end of the plasma-generating chamber such that active species migrate into the second chamber to interact with the materials placed therein.