The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2001
Filed:
Sep. 28, 1998
Yitzhak Eric Gilboa, Cupertino, CA (US);
Benjamin Brosilow, Afula, IL;
Sagy Levy, Sunnyvale, CA (US);
Hedvi Spielberg, Sunnyvale, CA (US);
Itai Bransky, Haifa, IL;
AG Associates (Israel) Ltd., , IL;
Abstract
Systems and methods are described for semiconductor wafer pretreatment. A method of treating a semiconductor wafer, includes contacting the semiconductor wafer with a mixture including HF and CH,OH; and then contacting the semiconductor wafer with Cl,and simultaneously exposing said semiconductor wafer to a source of ultraviolet energy. The selective HSG temperature of formation window is widened. In addition, robustness with regard to changes in the reactor ambient and substrate condition, and selectivity with regard to underlying dielectric layers, are both improved.