The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2001

Filed:

May. 07, 1999
Applicant:
Inventor:

Jianping P. Yang, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/58 ; C09D 5/44 ; C25D 1/300 ; C25D 1/500 ;
U.S. Cl.
CPC ...
C08F 2/58 ; C09D 5/44 ; C25D 1/300 ; C25D 1/500 ;
Abstract

In one aspect, the invention encompasses a method of fabricating a display screen. Phosphor molecules are electrophoretically deposited onto a substrate in a first solution having a first hydroxide ion concentration. The deposited phosphor molecules are then rinsed with second solution having an hydroxide ion concentration greater than the first hydroxide ion concentration. In another aspect, the invention encompasses a method of depositing phosphor molecules over selected regions of a substrate. Conductive regions are formed over portions of a substrate while non-conductive regions are left over other portions of the substrate. Phosphor molecules are electrophoretically deposited onto the conductive regions of the substrate in a first solution having a first hydroxide ion concentration. The substrate is then rinsed with a second solution having a second hydroxide ion concentration. The second hydroxide ion concentration is greater than the first hydroxide ion concentration. After the rinsing, the deposited phosphor molecules are dried. In yet another aspect, the invention encompasses a method of forming an FED device.


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