The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2001

Filed:

Jul. 30, 1999
Applicant:
Inventors:

Tsutae Omori, Yamanashi-Ken, JP;

Mitsuhiro Sakai, Kumamoto-Ken, JP;

Shinobu Tanaka, Kumamoto-Ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 ;
U.S. Cl.
CPC ...
G03D 5/00 ;
Abstract

When an edge processing head is scanned in one direction, the discharge of a rinse solution from a rinse solution discharge nozzle at the front in a carrying direction is stopped, a developing solution is discharged from a developing solution discharge nozzle, and a rinse solution is discharged from a rinse solution discharge nozzle at the rear in the carrying direction. Specifically, with a developing solution being discharged to a glass substrate, the discharge of a rinse solution immediately follows the discharge of the developing solution. Thus, the edge processing of the substrate can be performed with minimal increases in the number of processes and in installation.


Find Patent Forward Citations

Omori, Tsutae. (2001). Substrate processing apparatus and substrate processing method (U.S. Patent No. 6203218). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6203218

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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