The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Nov. 04, 1998
Applicant:
Inventors:
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7244 ;
U.S. Cl.
CPC ...
H01J 3/7244 ;
Abstract
Disclosed is a system and method for enhancing edge, topography, and materials in SEM images. The enhancements are achieved by collecting secondary electrons at narrow energy bands. This allows construction of various “primary” images having specific features enhanced. Further enhancement is achieved by various manipulations and combinations of the “primary” images to obtain a final enhanced image. Yet further enhancements are achieved by assigning color to various “primary” images before constructing the final image.