The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2001

Filed:

Jan. 13, 1998
Applicant:
Inventors:

Lawrence Ferreira, Fall River, MA (US);

Sanjay Malik, Attleboro, MA (US);

Assignee:

Arch Specialty Chemicals, Inc., Norwalk, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 1/504 ;
U.S. Cl.
CPC ...
B01D 1/504 ;
Abstract

The present invention is directed to a process of removing trace acidic impurities from an impure solution of photoacid generating compounds in a solvent, comprising contacting an impure solution of at least one photoacid generating compound containing trace amounts of acidic impurities with an amine-containing ion exchange resin for a sufficient amount of time to remove substantially all of the acidic impurities from the impure solution, thereby producing a pure solution of at least one photoacid generating compounds substantially free of trace acidic impurities. The invention is also directed to a solution of at least one photoacid generating compound substantially free of trace acidic impurities made by the above process.


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