The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2001
Filed:
May. 28, 1999
Ryoichi Yokoyama, Tokyo, JP;
Jimpei Harada, Tokyo, JP;
Rigaku Corporation, Tokyo, JP;
Abstract
A novel method and novel apparatus that are capable of selecting, with a computer, reference Bragg reflections pc1 and pc2, which form a basis for determination of the crystallographic orientation of a crystal sample by the two-reflection method, automatically and easily and accurately, wherein; firstly, x-ray intensities and diffraction conditions of all Bragg reflections which are measurable are calculated using the crystallographic information, secondly, a weight-point according to both the x-ray intensity and the angle between the sample normal and the scattering vector is obtained for each of the Bragg reflections, thirdly, two Bragg reflections having the two largest weight-points are selected as the reference Bragg reflections pc1 and pc2, respectively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile