The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2001

Filed:

Mar. 23, 1999
Applicant:
Inventors:

Ling-Chen Kung, Hsinchu, TW;

Tsung-Yao Chu, Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/144 ; H01L 2/148 ; H01L 2/150 ;
U.S. Cl.
CPC ...
H01L 2/144 ; H01L 2/148 ; H01L 2/150 ;
Abstract

The present invention discloses a method for forming a wafer level package by first providing a silicon wafer that has a multiplicity of IC dies formed on a top surface, each of the IC dies has at least one peripheral I/O pad formed in an insulating layer, then forming at least one via plug of a conductive metal with a top surface exposed on the at least one peripheral I/O pad, then coating a layer of an insulating material that has sufficient elasticity on the surface of the wafer prior to the deposition and forming of a metal trace on the elastic material layer, at least one area array I/O pad is then formed at an opposite end of the metal trace with a solder bump formed on the I/O pad before they are reflowed into a solder ball. The elastic material layer deposited under the metal traces acts as a stress-buffing layer such that an IC circuit of high reliability can be produced on a wafer level for the low cost fabrication of IC assembly.


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