The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2001

Filed:

Mar. 11, 1998
Applicant:
Inventors:

Kazuya Satou, Hitachi, JP;

Hiroyuki Tanaka, Mito, JP;

Takeshi Nojiri, Ibaraki-ken, JP;

Naoki Kimura, Hitachi, JP;

Toranosuke Ashizawa, Hitachinaka, JP;

Seiji Tai, Hitachi, JP;

Ikuo Mukai, Hitachi, JP;

Seikichi Tanno, Hitachi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 1/62 ; H01J 6/304 ;
U.S. Cl.
CPC ...
H01J 1/62 ; H01J 6/304 ;

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Satou, Kazuya. (2001). Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel (U.S. Patent No. 6194826). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6194826

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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