The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2001

Filed:

Mar. 13, 2000
Applicant:
Inventors:

Tao Cheng, Kaoshung, TW;

Lin-June Wu, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18246 ;
U.S. Cl.
CPC ...
H01L 2/18246 ;
Abstract

Sewage water containing phosphate is passed through an anaerobic treatment chamber containing reductive-iron-dissolution (RID) material, such as ferric oxyhydroxide solids. The RID material releases ferrous ions into solution, which combine with the phosphate to produce ferrous-phosphate minerals, such as vivianite, which precipitate in the anaerobic chamber. Also, iron and phosphate remaining in the water can precipitate as ferric-phosphate minerals such as strengite, when the water is later aerated.


Find Patent Forward Citations

Cheng, Tao. (2001). Method to form a mask rom device with coding after source and drain implantation (U.S. Patent No. 6194275). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6194275

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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