The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
Apr. 05, 1999
Richard K. Klein, Mountain View, CA (US);
Asim A. Selcuk, Cupertino, CA (US);
Nicholas J. Kepler, San Jose, CA (US);
Christopher A. Spence, Sunnyvale, CA (US);
Raymond T. Lee, Sunnyvale, CA (US);
John C. Holst, San Jose, CA (US);
Stephen C. Horne, Austin, TX (US);
Advanced Micro Devices, Sunnyvale, CA (US);
Abstract
A method of forming minimal gaps or spaces in conductive lines pattern for increasing the density of integrated circuits by first forming an opening in an insulating layer overlying the conductive line by conventional optical lithography, followed by forming sidewalls in the opening to create a reduced opening, and using the sidewalls as a mask to remove, preferably by etching, a portion of the conductive line pattern substantially equal in size to the reduced opening.