The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
Mar. 05, 1999
Applicant:
Inventors:
Koichi Tanaka, Fukushima-ken, JP;
Koji Morita, Fukushima-ken, JP;
Tsutomu Takaku, Fukushima-ken, JP;
Assignee:
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ; B24B 2/900 ; B24B 5/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ; B24B 2/900 ; B24B 5/00 ;
Abstract
A polishing pad for pressing a work to be polished to a surface thereof, includes a structure obtained by being compressed under a temperature which is higher than an operating temperature for polishing the work and/or under a pressure which is equal or higher than an operating pressure for polishing the work. A method for polishing a includes the step of polishing the work by using the polishing pad.
Tanaka, Koichi. (2001). Polishing pad, method and apparatus for treating polishing pad and polishing method (U.S. Patent No. 6190238). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6190238
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile