The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

May. 19, 1998
Applicant:
Inventors:

Toyokazu Nakamura, Tokyo, JP;

Benjamin Tsai, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 ;
U.S. Cl.
CPC ...
G06K 9/00 ;
Abstract

An image signal of a large number of patterns of the same shape on an LSI wafer obtained by an image sensor is held in a memory circuit, by using a CMOS image sensor chip incorporating a one-dimensional CMOS photodiode array, an analog-to-digital conversion circuit, a memory circuit and a processing circuit. Then, the image signal and one-cycle and two-cycle displaced image signals cyclically displaced from the image signal by the processing circuit are algebraically processed by a defect detection algorithm in the processing circuit of the CMOS image sensor. By this processing, a defect image is extracted without using a normal inspection pattern. Thus, a high-speed processing, a simplification of a configuration of an apparatus and a miniaturization of the apparatus become possible.


Find Patent Forward Citations

Nakamura, Toyokazu. (2001). Pattern inspecting apparatus and inspecting method (U.S. Patent No. 6188785). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6188785

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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