The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2001
Filed:
Jun. 03, 1999
Applicant:
Inventors:
Hwa-sook Shin, Kyungki-do, KR;
Byeong-yun Nam, Kyungki-do, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/144 ; H01L 2/1461 ; C03C 2/568 ; C23F 1/00 ;
U.S. Cl.
CPC ...
H01L 2/144 ; H01L 2/1461 ; C03C 2/568 ; C23F 1/00 ;
Abstract
A method for forming a patterned platinum layer on a microelectronic substrate includes the steps of forming a platinum layer on the microelectronic substrate, and forming a mask layer on the platinum layer. In particular, the mask layer defines exposed portions of the platinum layer, and the mask layer comprises a mask material including titanium. The exposed portions of the platinum layer are then selectively removed to form the patterned platinum layer. Related structures are also disclosed.