The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2001
Filed:
Oct. 02, 1998
Paul K. Chu, Kowloon, HK;
Chung Chan, Newton, MA (US);
Silicon Genesis Corporation, Campbell, CA (US);
Abstract
A plasma treatment system (,) for implantation with a novel susceptor with shielding (,). The system (,) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (,) also has a susceptor disposed in the chamber to support a substrate. A shield (,) is disposed adjacent to the susceptor for blocking impurities that may possibly be introduced from a backside of the susceptor. The shield allows fewer impurities to be sputtered from the backside of the susceptor. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (,) on a surface of the chamber. The system (,) also has an rf generator (,) and at least two rf sources in other embodiments.