The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

Feb. 17, 1998
Applicant:
Inventors:

Jaewan Hong, Seoul, KR;

Sang-il Park, Seoul, KR;

Zheong-Gu Khim, Seoul, KR;

Assignee:

PSIA Corporation, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 7/34 ;
U.S. Cl.
CPC ...
G01B 7/34 ;
Abstract

A microscope uses electrostatic force modulation microscopy to measure mechanical and electrical characteristics of a sample. A tip contacts the sample while a voltage (which may have dc and ac components) is applied between the tip and sample. The tip oscillates even though the tip is contacting the sample due to strong electrostatic force interaction between the tip and sample. Different characteristics of the sample such as hardness, surface potential, capacitance, surface charge, and so forth, are measured by manipulating the oscillation of the tip relative to the sample and monitoring the position of the tip.


Find Patent Forward Citations

Hong, Jaewan. (2001). Method and apparatus for measuring mechanical and electrical characteristics of a surface using electrostatic force modulation microscopy which operates in contact mode (U.S. Patent No. 6185991). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6185991

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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